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Rhenium target
Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporation coating, it has quite obvious advantages in many aspects, as a has developed to a mature technology, magnetron sputtering has been applied in many fields, such as in the semiconductor integrated circuit, solar photovoltaic, recording medium, graphic display, and has been widely applied in such aspects as the surface coating.
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Rhenium Outer for MOCVD
Processing method: non-standard parts are processed according to customer drawings; Provide standard accessories K465i, K700, A7; Provide product repair service. 
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Rhenium Inner for MOCVD
Processing method: non-standard parts are processed according to customer drawings; Provide standard accessories K465i, K700, A7; Provide product repair service. 
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Tungsten rhenium bracket
Used for MOCVD hot field heating plate support, diameter 1mm or customized, transferred to mold setting, can ensure high dimensional accuracy. Can be customized according to customer size.
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Rhenium crucible
Specification: thickness is 3~6mm,  density 18.8g/cc min, purity 99.99% min.Shape and size can be customized,
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Welding rhenium tube
Processing method: Non-standard parts are processed according to customer drawings; Provide standard accessories; Provide product repair service
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